Electrical properties of Si-doped GaAs layers
grown on (411)A GaAs substrates by molecular beam epitaxy (MBE) were
investigated for applications to GaAs/AlGaAs resonant tunnelling diodes with
atomically flat (411)A GaAs/AlGaAs interfaces over an entire device area. These
flat interfaces can be realized by MBE under certain growth conditions (growth
temperature Ts=580°C and V/III pressure ratio of less than or equal to 11).
When the V/III pressure ratio is high (above 15) for Ts=580°C, Si-doped GaAs on
a (411)A substrate showed an n-type conduction similar to conventional Si-doped
GaAs on (100) substrates. (411)A GaAs/AlGaAs interfaces grown under this
condition, however, cannot become as flat and as superior as conventional (100)
GaAs/AlGaAs interfaces. On the other hand, when the V/III pressure ratio is 7,
an Si-doped GaAs layer on (411)A showed p-type conduction. In the case of a
V/III pressure ratio of 10.5 and Ts=580°C, Si-doped GaAs still showed n-type conduction with the
compensation ratio ν (≡(ND+NA)/(ND-NA)) = 2.3. This result suggests that Si can
be used as an n-type dopant in GaAs for GaAs/AlGaAs resonant tunnelling diodes
grown on (411)A GaAs substrates with atomically flat (411)A GaAs/AlGaAs
interfaces.
Source:IOPscience
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