In this work GaAs nanowires were grown by self-assisted growth method with completely identical growth parameters, such as growth temperature, growth time, Ga and As flux, on GaAs (111)B and Si (111) substrates using Molecular Beam Epitaxy (MBE). All samples were then characterized by Scanning Electron Microscope (SEM), Energy-dispersive X-ray spectroscopy (EDX), and X-ray Diffraction (XRD). The results from both substrates were compared in order to understand the effect of substrate type on nanowires.
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