Pulse plating of Pt on n-GaAs (100) wafer surfaces: Synchrotron induced photoelectron spectroscopy and XPS of wet fabrication processes

Preparation steps of Pt/n-GaAs Schottky contacts as applied in the fabrication process of varactor diode arrays for THz applications are analysed by photoelectron spectroscopy. Pulsed cathodic deposition of Pt onto GaAs (1 0 0) wafer surfaces from acidic solution has been studied by core level photoelectron spectroscopy using different excitation energies. A laboratory AlKα source as well as synchrotron radiation ofhν=130 and 645 eV at BESSY was used. Chemical analyses and semiquantitative estimates of layer thickness are given for the natural oxide of an untreated wafer surface, a surface conditioning NH₃ etching step, and stepwise pulse plating of Pt. The structural arrangement of the detected species and interface potentials are considered.

Source: sciencedirect

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